High Vacuum, Triple Magnetron Target Desk Sputter Coater-DST3-A/S
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- Manufacturer warranty included
- Calibration certificate on request
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High Vacuum, Triple Magnetron Target Desk Sputter Coater – DST3-A/S
The DST3-A/S is a versatile, multi-target high vacuum sputter coater with turbo molecular pumping, designed to deposit a broad range of materials. Its roomy 300 mm diameter chamber houses three 2" water-cooled cathodes, which support long deposition runs.
Both RF and DC power supplies are available, so this triple magnetron target desk sputter coater can sputter semiconductors, dielectrics, and metal targets, including oxidizing and noble metals. An auto-adjustable matching box keeps reflected power to a minimum and helps refine the RF sputtering process.
An optional 300 V DC bias can be applied to the substrate to strengthen film adhesion and improve film structure.
The DST3 comes in two models, each defined by its cathode configuration.
Applications
- Metal, semiconductor, and dielectric films
- Nano and microelectronic applications
- Solar cell development
- Co-sputtering processes
- GLAD sputtering technique
- Coating of optical components
- Thin film sensor fabrication
- Production of magnetic thin film devices
- Fine-grain structural deposition for SEM and FE-SEM sample preparation
Features and Advantages
Hardware
- High vacuum performance from a built-in turbo pump
- DC power supply, with an optional RF power supply, for coating metals, semiconductors, and dielectrics
- Three 2-inch water-cooled, angled magnetron cathodes for alloy film production (DST3-A) and multilayer deposition
- Large 8-inch sample holder stage on the DST3-S model
- Cathode mask designed to deliver uniform deposition across large substrates (DST3-S)
- Two quartz crystal monitoring systems, one fixed and one movable, for real-time thickness measurement with 1 nm precision
- Gas injection managed by two Mass Flow Controllers (MFCs)
- Electronic gas valves
- Two-stage rotary vane backing pump (diaphragm and scroll pump)
- Full range vacuum gauge
- Cathode selection motor
- Adjustable sample rotation, height, and tilt (for 3-inch sample holders)
- Three manual shutters, with optional electronic shutters
- Optional programmable substrate heater
- Unlimited deposition time without breaking vacuum
- Two-year warranty
Automation
- Intuitive touch screen for simple control of the coating process and fast data entry
- User-friendly software that can be updated over a network connection
- Optional semi-fully automatic coating process
- Repeatable, programmable sputtering in automatic mode
- Optional adjustable DC, RF, and high current deposition parameters through the touch screen panel
- Manual or automatic deposition by time or thickness
- Storage of coating recipes for repeatable depositions
- Target selection for multilayer thin films
- Electronic shutters for precise control
- Automated cathode selection
- Substrate heater programming and control through the software
Optional Facilities
The DST3 vacuum coater has a cylindrical Pyrex vacuum chamber measuring 300 mm in outer diameter and 200 mm in height. An internally mounted 90 L/s turbo molecular pump, backed by a 6 m³/h two-stage rotary vane pump, ensures efficient vacuum operation.
Clean Vacuum
- RF sputtering for depositing both conductive and non-conductive targets
- Plasma cleaner for enhanced cleaning capability
- 300 V DC substrate bias voltage
- 500 °C substrate heater for precise temperature control during coating
Touch Screen Control
The DST3 includes a 7" color touch-screen panel with user-friendly software for smooth control and adjustment of deposition process data. Vacuum and coating sequence information appears as digital readouts or curves on the screen, making monitoring straightforward. The system also keeps records of the last 300 coatings on a history page for easy reference.
Sample Holder Stages
Two standard sample holder sizes are available: 3 inches, offered on both the DST3-A and DST3-S models, and 8 inches, exclusive to the DST3-S. Custom sizes can also be requested to match specific requirements. The smaller sample holders include multiple clamps that secure small samples during rotation, providing a simple and effective solution.
Plasma Cleaner
The DST3 can be fitted with an optional plasma cleaner. Plasma treatment, or cleaning, removes organic substances from a substrate's surface or modifies it using ionized gas, known as plasma. This process can change the surface properties of the substrate, increasing either its hydrophilicity or hydrophobicity so that later depositions go on effectively. Applying plasma before thin film deposition also clears surface contaminants, such as carbon-based residues and oxides, and improves adhesion between the substrate and the layers that follow.
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DST3-A (Angled Cathodes)The DST3-A has three angled cathodes that share a common focal point. This layout permits simultaneous sputtering from two or three (optional) targets, enabling alloy formation or multilayer deposition. The maximum substrate size for this model is 3 inches. |
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DST3-S (Straight Cathodes)The DST3-S is fitted with three straight 2-inch water-cooled cathodes. It is designed for sputtering a single large specimen up to 20 cm in diameter, or several smaller specimens. |
Technical Specifications
- Ultimate Vacuum: Less than 8x10-6 Torr
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Pumping Speed (l/s)
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90
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350
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Ultimate Pressure (Torr)
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8×10-6
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3×10-6
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- Each cathode can independently control the sputtering rate to produce fine-grain structures.
- The maximum thickness for each target, including the backing plate, is 6 mm.
- The deposition power is automatically controlled regardless of the pressure.
- The cathode temperatures are automatically regulated to prolong the life of the magnets.
- Data is quickly recorded using fully automatic touch screen control.
- Two precision Mass Flow meters (MFC) allow precise control of vacuum pressure and the flow of argon or other reactive sputtering gases.
- An electronic throttle valve is included for the 350 l/s turbo pump.
- Coating parameters are recorded and plotted.
- Curves and data from the deposition process can be transferred via a USB port to a PC.
- An optional 300V DC bias voltage can be added.
- There's an option for a plasma cleaner.
- The system includes a 0-1200 V, 0-500 mA DC power supply.
- An optional 300 W RF power supply with an automatic matching box is available.
- Utilities: 220/110V, 50/60HZ, with a current rating of 16/25A.
- Instrument Dimensions: 600 Width × 800 Depth × 770 Height mm (excluding the rack).
- Net Weight: 160 kg, including the pump, rack, and instrument case.
Options and Accessories
- Quartz crystal sensor
- Spare glass chamber
- Sputtering targets
- Sealing gaskets
- 300V DC bias voltage
- Plasma cleaner
- 500°C substrate heater
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