Torontech

Load-Lock Sputter-Up Deposition System

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Load-Lock Sputter-Up Deposition System – ToronSputter™ SU

Load-Lock Magnetron Sputtering System – Sputter-Up

The Load-Lock Sputter-Up Deposition System integrates upward-facing magnetron sputtering sources and organic effusion cells within a single load-lock chamber, allowing inorganic and organic thin films to be deposited together. In the sputter-up layout, targets sit beneath a downward-facing substrate, which supports confocal deposition geometry and the integration of multiple sources. A dedicated load-lock pump reaches 10⁻⁶ Torr in 10 minutes, while the main chamber holds a base pressure of 10⁻⁸ Torr. Samples are exchanged through the load-lock with a magnetic arm, making 20 to 30 experiments per day possible.

Organic Evaporation, Inorganic Sputtering, and Thermal Sources

Organic evaporation relies on PID-controlled effusion cells operating from 50 to 800 °C with ±1 °C stability, suited to depositing organic semiconductor and OLED materials. For inorganic films, 1 to 6-inch RF and DC sputtering guns deposit conductors and insulators such as Au, Al, TiN, and SiO₂ at high rates under recipe control. Digital MFC gas inlets with 0.1 sccm sensitivity support both inert and reactive sputtering. High-power thermal sources rated at 8V to 500A, 5000W add sequential evaporation and co-evaporation within the same run.

Substrate Heating, Thickness Monitoring, and Process Control

PID-controlled substrate heating from 50 to 600 °C at ±1 °C, together with 2 to 30 rpm rotation and DC/RF plasma cleaning, enables deposition onto heated substrates. A dual-channel thickness controller with two QCMs monitors deposition rate and cumulative thickness at 0.1 Å/s resolution. Vacuum control covers 10⁻¹ to 10⁻⁹ Torr and includes downstream and upstream pressure-fixing capability. An automatic on-off water cooling interlock and a UV-blocking observation window with LabVIEW shutter control handle process safety and deposition timing.

Load-Lock Sputter-Up Deposition System – ToronSputter™ SU Applications

Combined Sputtering and Organic Evaporation for Thin Film Research

The Load-Lock Sputter-Up Deposition System supports organic and inorganic thin film research that calls for sputter deposition and organic evaporation on one continuous-vacuum platform. Its confocal sputter-up geometry, organic effusion cells, and load-lock design make it well suited to multilayer organic-inorganic device fabrication and high-throughput PVD research programs.

Key Application Areas

  • OLED and Organic Light-Emitting Device Fabrication: Organic emitter and transport layers are deposited by effusion cell, and metal electrode layers by sputtering, all in situ with no air exposure between steps.
  • Organic Photovoltaic Cell Research: Sputter-up deposition of transparent contact layers and reactive-sputtered oxide films, together with effusion-deposited organic active layers, supports OPV device prototyping.
  • Perovskite Solar Cell Development: Organic hole-transport layers and metallic contacts are deposited in a single vacuum environment, which reduces defects caused by exposure to atmospheric moisture and oxygen.
  • Organic Semiconductor and OFET Research: Effusion cells provide precise deposition of small-molecule organic semiconductors, while confocal sputter-up metallization forms the device contacts.
  • Optical Thin Film Research: Reactive sputter-up deposition of TiO₂, SiO₂, and other optical coatings, paired with downstream pressure control, delivers stoichiometric accuracy.
  • Hard Coating and Surface Engineering: Reactive RF sputtering of TiN, CrN, DLC, and related films from below-mounted, upward-facing targets coats tooling and mechanical components.
  • High-Throughput Multi-Material PVD Research: Load-lock sample exchange enables 20 to 30 experiments per day, supporting iterative multilayer organic-inorganic deposition programs.
Load-Lock Sputter-Up Deposition System Load-Lock Sputter-Up Deposition System

Load-Lock Sputter-Up Deposition System – ToronSputter™ SU Key Features

Load-Lock Sputter-Up Deposition System

High-Vacuum Platform for Combined Organic-Inorganic Thin Film Research

The Load-Lock Sputter-Up Deposition System brings together confocal sputter-up magnetron guns, Knudsen effusion cells for organic materials, MFM gas control, and load-lock sample exchange in one high-vacuum platform built for combined organic-inorganic thin film research.

Deposition Sources and Chamber Geometry

  • 50 to 800 °C Effusion Cells for Organic Evaporation (±1 °C PID): Knudsen effusion cells deliver precise deposition of organic semiconductors, OLED emitters, and hole-transport materials in the same chamber as the sputtering sources, a combination that sets this system apart from sputter-down configurations.
  • 1 to 6-Inch RF and DC Sputter-Up Guns with Flex-Head Rotation: Upward-facing guns feature self-axis rotation and compression seals, creating a confocal multi-source deposition geometry aimed at downward-facing substrates.
  • Confocal Sputter-Up Geometry: Multiple gun axes converge at a shared point at the center of the substrate. This improves co-deposition uniformity and allows multi-material deposition without repositioning the substrate.
  • 8V to 500A, 5000W Thermal Sources for Co-Evaporation: High-power thermal sources support sequential and co-evaporation, with a design that prevents cross-contamination and makes material replacement easy.
  • Load-Lock Adaptable to E-Beam and Thermal Source Systems: The load-lock architecture can be configured for platforms that combine magnetron sputtering with e-beam and thermal evaporation sources.

Vacuum Performance and Sample Handling

  • 10⁻⁸ Torr Main Chamber Base Pressure: A turbomolecular and mechanical pump combination, with a dry pump option, sustains the base pressure needed for high-purity organic and inorganic film deposition.
  • Dedicated Load-Lock Pump, 10⁻⁶ Torr in 10 Minutes: A separate pumping system evacuates the load-lock without disturbing the vacuum in the main chamber, and it can be adapted to e-beam and thermal source platforms.
  • Magnetic Arm Sample Transfer, 2" to 6" Substrates: A magnetic arm loads and unloads substrates from 2" to 6" in diameter, with easy sample exchange options.
  • 20 to 30 Experiments Per Day: The load-lock design allows rapid sample cycling, which supports high-throughput multilayer research and iterative device fabrication programs.
  • Throttle, Vent, Isolation, and Gate Valve Configuration: A comprehensive valve set manages every pressure transition, and the isolation valve keeps the main chamber under continuous vacuum while idle.
  • Wide-Range Vacuum Control (10⁻¹ to 10⁻⁹ Torr) with Pressure Fixing: Vacuum measurement and downstream or upstream pressure-fixing capability provide precise reactive sputtering process windows.

Process Control and Monitoring

  • 50 to 600 °C PID Substrate Heating with ±1 °C Sensitivity: Closed-loop substrate temperature control helps manage film crystallinity, adhesion, and interface quality across a wide temperature range.
  • 2 to 30 rpm Sample Rotation with DC/RF Plasma Cleaning: PC-controlled substrate rotation promotes deposition uniformity, while DC/RF plasma cleaning removes surface oxides before deposition begins.
  • Digital MFC Gas Inputs (Ar, N₂, O₂, He, CH₄) at 0.1 sccm Sensitivity: MFC-controlled mixed gas delivery supports both inert and reactive sputtering processes.
  • 0.1 Å/s Dual-Channel Thickness Monitoring with Two QCMs: Rate and thickness are measured simultaneously across the organic and inorganic deposition channels.
  • UV-Blocking Observation Window with LabVIEW Shutter Control: A rotatable door shutter and a LabVIEW-integrated sample shutter provide precise deposition timing and tie into thickness control.
  • Fully Automatic Computer and Panel Control with LCD Displays: Computer control runs all deposition operations automatically, with panel override and real-time process monitoring on LCD displays.
  • Interlock-Protected Automatic Water Cooling: Closed-loop water cooling switches on and off automatically, and an interlock blocks source operation unless coolant is flowing.

Chamber Construction and Configuration

  • SS304 Chamber (Prismatic or Cylindrical) with Electro-Polished Surfaces: The feather-touch, electro-polished interior includes an SS304 liner, and water-cooled chamber surfaces are available when needed.
  • Standard 1-Inch, QF, CF, and ISO Feedthrough Ports: Configurable port selection allows upgrades with additional thermal and sputtering sources.

Warranty

  • Two-Year Warranty for Materials, Design, and Workmanship: Comprehensive two-year coverage applies to system components, design, and manufacturing quality.

Load-Lock Sputter-Up Deposition System – ToronSputter™ SU Theory and Method

Sputter-Up Geometry and Confocal Deposition

In sputter-up magnetron sputtering, the targets sit below a downward-facing substrate, so its deposition surface receives sputtered flux traveling upward. This substrate-down, source-up layout supports confocal arrangements in which several gun axes meet at the center of the substrate, which improves composition uniformity during co-deposition. Because the downward-facing substrate sits directly above the organic effusion cells, organic and inorganic layers can be deposited sequentially or simultaneously within one vacuum cycle. Load-lock access lets samples move in and out through the antechamber while the main chamber stays under vacuum.

Organic Evaporation and Thickness Monitoring

Organic materials are evaporated from Knudsen effusion cells, rather than from the high-current boats used for inorganic metals. PID control at ±1 °C across 50 to 800 °C keeps the molecular flux stable, which matters because organic materials react disproportionately to small temperature changes. QCM thickness monitoring at 0.1 Å/s follows organic and inorganic film growth in real time across two channels. In the sputter-up configuration, organic and metallic sources share the same side of the chamber, so both can be deposited onto the same substrate face without repositioning.

Vacuum Architecture and Pressure Control

The main chamber maintains a 10⁻⁸ Torr base pressure using a turbomolecular and mechanical pump combination, and a separate load-lock pump reaches 10⁻⁶ Torr in 10 minutes. Throttle, vent, isolation, and gate valves govern every vacuum transition, and the main chamber remains continuously under vacuum whenever the system is idle. Vacuum measurement and control cover 10⁻¹ to 10⁻⁹ Torr, with downstream or upstream pressure-fixing capability. High-power thermal sources rated at 8V to 500A, 5000W complement sputtering by adding co-evaporation and sequential deposition capability.

Load-Lock Sputter-Up Deposition System - ToronSputter™ SU Technical Specifications

Parameter Specification
Deposition Configuration Sputter-up (substrate-down, sources-up)
Organic Evaporation Knudsen effusion cells; 50 to 800 °C; PID controlled; ±1 °C
Main Chamber Base Pressure 10⁻⁸ Torr
Load-Lock Vacuum Level 10⁻⁶ Torr in 10 minutes
Vacuum Control Range 10⁻¹ to 10⁻⁹ Torr
Pump Configuration Turbomolecular + Mechanical (dry pump optional); dedicated load-lock pump
Valve Configuration Throttle, vent, isolation, and gate valves
Chamber Material SS304 (prismatic or cylindrical); electro-polished; SS304 liner
Chamber Surface Cooling Water-cooled surfaces (when needed)
Feedthrough Ports Standard 1-inch, QF, CF, ISO
Observation Window UV-blocking; rotatable door shutter
Sputtering Guns 1 to 6 inches (upward-facing); RF and DC; flex-head; self-axis rotation; compression seal
Thermal Sources 8V to 500A, 5000W (sequential and co-evaporation)
Sample Transfer Magnetic transfer arm
Sample Sizes 2", 3", 4", 6"
Substrate Heating 50 to 600 °C (PID controlled, ±1 °C)
Sample Rotation Speed 2 to 30 rpm (PC controlled)
Plasma Cleaning DC/RF plasma
Gas Inputs Ar, N₂, O₂, He, CH₄ and others; digital MFC; 0.1 sccm sensitivity
Pressure Control Method Downstream and upstream flow control
Thickness Monitoring Dual-channel; 0.1 Å/s precision; 2 QCMs
Cooling System Automatic closed-loop water cooling (interlock protected)
Control System Fully automatic computer control; panel control; real-time LCD; LabVIEW
Experiment Throughput 20 to 30 experiments per day
Warranty 2 years (materials, design, and workmanship)
Delivery time varies upon stock availability. Our standard dispatch and shipping times are generally within 1 week, however for some high demand items the delivery may be extended to 2-3 weeks. If you require these items urgently please contact us to check accurate stock availability and to organize faster shipping methods.
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Delivery time varies upon stock availability. Our standard dispatch and shipping times are generally within 1 week, however for some high demand items the delivery may be extended to 2-3 weeks.

Need it urgently? Contact us here to check stock and organize faster shipping.

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