Spin Coater - Serie ToronSC™

Our lineup of Spin Coater systems supplies semiconductor fabrication facilities, optics laboratories, and nanotechnology research centers with reliable thin-film deposition instruments. Featuring multi-step programmable spin recipes, speeds up to 10000 RPM, and chemical-resistant PTFE process bowls, these units apply uniform liquid coatings across substrates ranging from small silicon chips up to 300 mm wafers.

With options including vacuum chucks, safety lid interlocks, and oil-free vacuum pumps, this spin coater series supports photoresist coating, sol-gel synthesis, and organic electronics development. Incorporating these precision spin coating platforms into your cleanroom setup ensures consistent film thickness and repeatable deposition results across processing batches.