{"product_id":"magnetron-sputtering-system","title":"Magnetron Sputtering System","description":"\u003ch2\u003eMagnetron Sputtering System\u003c\/h2\u003e\n\u003cp\u003eThe ToronSP-400 Magnetron Sputtering System is a box-type Physical Vapor Deposition (PVD) platform built around a prismatic or cylindrical vacuum chamber. It supports 1 to 4 DC\/RF sputtering sources, so multi-layered thin films can be deposited from up to four different materials in a single system.\u003c\/p\u003e\n\u003cp\u003eThe ToronVak Sputter System can be configured to match specific user requirements, making it suitable for producing multilayered nanoscale metallic, oxide, carbide, or nitride films. Compatible materials include Ni, Fe, Au, Zr, Ti, Si, SiO₂, ZnO, TiO₂, Si₃N₄, SiC, and more.\u003c\/p\u003e\n\u003ch2\u003eApplications\u003c\/h2\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/a2_dba5cdac-c630-400b-baef-baedd6cf9b0b.webp?v=1792775130\" alt=\"Magnetron Sputtering System\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eSemiconductor \u0026amp; Microelectronics\u003c\/strong\u003e – Deposits multilayer thin films for integrated circuits, sensors, and optoelectronic devices, delivering high precision and uniformity at the nanoscale.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMaterials Science \u0026amp; Nanotechnology\u003c\/strong\u003e – Supports the development of advanced metallic, oxide, carbide, and nitride coatings for research, prototyping, and functional material innovation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptics \u0026amp; Photonics\u003c\/strong\u003e – Produces anti-reflective, conductive, and dielectric coatings on optical components, lasers, and photonic devices to enhance performance.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEnergy \u0026amp; Renewable Technologies\u003c\/strong\u003e – Creates thin-film coatings for solar cells, fuel cells, and energy storage devices, improving both efficiency and durability.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAerospace \u0026amp; Automotive Engineering\u003c\/strong\u003e – Applies wear-resistant, corrosion-resistant, and thermal barrier coatings to critical components for greater reliability under extreme conditions.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSurface Engineering \u0026amp; Coating Services\u003c\/strong\u003e – Delivers precision deposition of tailored thin films on a variety of substrates for industrial applications, prototyping, and specialized contract coating projects.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eResearch \u0026amp; Development\u003c\/strong\u003e – Offers a versatile platform for universities, laboratories, and corporate R\u0026amp;D centers to explore new materials, deposition techniques, and multilayer coating processes.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eFeatures\u003c\/h2\u003e\n\u003col\u003e\n\u003cli\u003e\n\u003cstrong\u003eFully Automated Touchscreen Control\u003c\/strong\u003e – Real-time LCD display for smooth, intuitive operation\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eHigh-Quality Vacuum Chamber\u003c\/strong\u003e – Prismatic or cylindrical SS304 chamber with electro-polished surfaces, available in 30, 40, 50, and 60 cm sizes\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEnhanced Visibility \u0026amp; Access\u003c\/strong\u003e – Front viewing window and rotatable shutter\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVersatile Connectivity\u003c\/strong\u003e – Standard 1\", QF, CF, and ISO ports\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptimized Internal Systems\u003c\/strong\u003e – Built-in lighting and a baking system reaching up to 120°C\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePower Supply Options\u003c\/strong\u003e – RF: 13.6 MHz, 300–1200 W | DC: 0–1000 V, 2000 W\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eHigh Vacuum Performance\u003c\/strong\u003e – Base pressure of 10⁻⁸ Torr; reaches 2x10⁻⁶ Torr in 20 minutes\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAdvanced Pumping System\u003c\/strong\u003e – Turbomolecular and mechanical pump, with cryo and dry pump options\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWide-Range Vacuum Control\u003c\/strong\u003e – Precision monitoring from 1000 to 10⁻⁹ Torr\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCustomizable Sample Processing\u003c\/strong\u003e – PID-controlled heating (50–700°C) and adjustable sample rotation (2–30 rpm)\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePlasma Cleaning Unit\u003c\/strong\u003e – RF plasma cleaning through RF biasing\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEfficient Cooling System\u003c\/strong\u003e – Closed-loop water cooling with automatic start-stop\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePrecision Coating Control\u003c\/strong\u003e – Dual-channel thickness rate measurement (0,1Å\/s) with 1–4 QCMs\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eFlexible Sputtering Options\u003c\/strong\u003e – 1–4 DC\/RF magnetron sputter sources (1”, 2”, 3”, 4”)\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eGas Flow Management\u003c\/strong\u003e – Mass flow meter-controlled inputs (Ar, N₂, O₂, He, CH₄, H₂) with 3-channel real-time control\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePressure Regulation\u003c\/strong\u003e – Throttle, vent, and isolation valves for precise pressure adjustment (1–100 mTorr)\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptimized Experiment Cycle\u003c\/strong\u003e – 1.5-hour cycle time\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum Retention\u003c\/strong\u003e – Isolation valve keeps the chamber under vacuum when idle\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSmart PC Control\u003c\/strong\u003e – LabVIEW-based automation for multi-layer coatings\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAdditional Precision Monitoring\u003c\/strong\u003e – Capacitance manometer for accurate plasma pressure measurement\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCompact \u0026amp; Mobile Design\u003c\/strong\u003e – 75x120 cm footprint with lockable wheels; fits through standard doors\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eReliable Build\u003c\/strong\u003e – One-year warranty covering design, materials, and craftsmanship\u003c\/li\u003e\n\u003c\/ol\u003e\n\u003ch2\u003eTheory of Operation\u003c\/h2\u003e\n\u003cp\u003eA magnetron sputtering system deposits thin films of metal or other materials onto a substrate. It is a core tool for coatings used in electronics, optics, tooling, and research, where film thickness and purity must be tightly controlled.\u003c\/p\u003e\n\u003ch2\u003eSputtering in a Plasma\u003c\/h2\u003e\n\u003cp\u003eThe process takes place in a vacuum chamber filled with a small amount of inert gas, typically argon. A high voltage applied to the target, which is the source material, ionizes the gas and forms a plasma. Positively charged argon ions accelerate toward the target and dislodge atoms from its surface, a process known as sputtering. These atoms cross the chamber and condense on the substrate, building up a film.\u003c\/p\u003e\n\u003ch2\u003eThe Role of the Magnetron\u003c\/h2\u003e\n\u003cp\u003eMagnets positioned behind the target generate a magnetic field that holds electrons close to the target surface. This concentrates the plasma where it is needed, increasing the sputtering rate and allowing the system to deposit films faster and at lower pressure. The outcome is a dense, uniform coating with good adhesion, produced under controlled, repeatable conditions.\u003c\/p\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51259080147183,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/magnetron-sputtering-system11200.webp?v=1792775167","url":"https:\/\/shop.torontech.com\/products\/magnetron-sputtering-system","provider":"Torontech","version":"1.0","type":"link"}