{"product_id":"load-lock-equipped-coating-system","title":"Load-Lock Equipped Coating System","description":"\u003ch2\u003eLoad-Lock Equipped Coating System\u003c\/h2\u003e\n\u003cp\u003eThe ToronTS-450 coating system, fitted with Load-Lock chambers, speeds up processing and improves coating quality. Samples are loaded and unloaded through the Load-Lock chamber, and a magnetic transfer arm carries each one into the main chamber.\u003c\/p\u003e\n\u003ch2\u003eCompatible Deposition Systems\u003c\/h2\u003e\n\u003cp\u003eThis upgrade can be added to Thermal, Sputtering, E-Beam, and HiPIMS systems across our product line. With the ToronVak Load-Lock configuration, coating runs in a high-vacuum environment of 10⁻⁷ Torr, and a fresh wafer can be loaded every 15 minutes.\u003c\/p\u003e\n\u003ch2\u003eApplications\u003c\/h2\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/a1_5b667dce-7349-404d-a72a-77029a4dd7d6.webp?v=1792993557\" alt=\"Load-Lock Equipped Coating System\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eSemiconductor and Wafer Fabrication:\u003c\/strong\u003e Supports high-throughput thin film deposition on wafers while keeping contamination risk low. Continuous processing and frequent sample exchange keep production moving.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMicroelectronics and Optoelectronics:\u003c\/strong\u003e Delivers precise coatings of conductors and insulators for sensors, MEMS devices, photodetectors, and other optoelectronic components, all under stable vacuum conditions.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEnergy and Photovoltaics:\u003c\/strong\u003e Produces advanced coatings for solar cells and energy storage devices, building high-efficiency multilayer thin films through reactive sputtering and thermal sources.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAerospace and Automotive Engineering:\u003c\/strong\u003e Applies durable metallic and dielectric coatings to critical components, improving performance, wear resistance, and thermal stability.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eDisplay and Optical Coatings:\u003c\/strong\u003e Deposits transparent, anti-reflective, and conductive layers on glass, optics, and display substrates, with recipe-controlled uniformity.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSurface Engineering and Industrial Coating Services:\u003c\/strong\u003e Offers a dependable platform for contract coating operations, allowing efficient multi-sample processing with less downtime.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eResearch and Development:\u003c\/strong\u003e Provides a flexible system for universities, laboratories, and corporate R\u0026amp;D teams exploring new thin film materials, coating techniques, and multilayer architectures.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eFeatures and Advantages\u003c\/h2\u003e\n\u003col\u003e\n\u003cli\u003e\n\u003cstrong\u003eChamber Design:\u003c\/strong\u003e The prismatic or cylindrical vacuum chamber is built from SS304 and finished with an electro-polished, feather-touch inner surface. Water-cooled surfaces are available as an option.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePort Configuration:\u003c\/strong\u003e Standard 1\", QF, CF, and ISO ports make it simple to add more thermal or sputter sources later.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eObservation and Control:\u003c\/strong\u003e A UV-blocking observation window, a rotatable door shutter, and a LabVIEW-programmed sample shutter work together to give precise thickness control.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum System:\u003c\/strong\u003e Turbo-molecular, mechanical, and dry pumps provide fast pump-down and bring the main chamber to a base pressure of 10⁻⁸ Torr.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eLoad-Lock Performance:\u003c\/strong\u003e Dedicated pumps reach 10⁻⁶ Torr in 10 minutes, and the load-lock can be configured for sputtering, e-beam, and thermal sources.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eValves and Isolation:\u003c\/strong\u003e Throttle, vent, isolation, and gate valves keep the chamber under vacuum while it sits idle.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAutomated Control:\u003c\/strong\u003e Deposition runs fully automatically through software or panel control, with real-time LCD displays.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCooling System:\u003c\/strong\u003e An automatic closed-loop water cooling system includes interlock protection, which prevents power activation unless proper vacuum conditions are present.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSputtering Capabilities:\u003c\/strong\u003e RF- and DC-driven sputtering guns from 1\" to 6\" feature flex heads, self-axis rotation, and compression sealing.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMaterial Coating:\u003c\/strong\u003e The system coats conductors (Au, Al, Ti, Ni) and insulators (MgO, TiO₂, SiO₂, TiN) at high rates, with recipe-based control.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum Precision:\u003c\/strong\u003e Downstream and upstream regulation allow adjustable vacuum control from 1000 to 10⁻⁹ Torr.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSample Heating and Rotation:\u003c\/strong\u003e PID-controlled heating spans 50 to 600°C with ±1°C sensitivity, and rotation is adjustable from 2 to 30 rpm. DC\/RF plasma cleaning is also included.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eLoading Mechanism:\u003c\/strong\u003e A magnetic transfer arm handles 2\", 3\", 4\", and 6\" samples with ease.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eThickness Measurement:\u003c\/strong\u003e Two QCMs provide dual-channel thickness-rate measurement with 0.1 Å\/s precision.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eThermal Sources:\u003c\/strong\u003e Thermal sources rated at 8V to 500A and 4000W support sequential and co-evaporation. Their design limits cross-contamination and allows quick source replacement.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEffusion Cells:\u003c\/strong\u003e Cells operating from 50 to 800°C (±1°C) are available for organic evaporation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eGas Mixing and Sputtering:\u003c\/strong\u003e Digital MFC-controlled gas inputs (Ar, N₂, O₂, He, CH₄, and others) offer 0.1 sccm sensitivity for reactive sputtering.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEfficiency:\u003c\/strong\u003e A 1.5-hour experiment cycle makes it possible to run 10 to 15 experiments per day.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWarranty:\u003c\/strong\u003e A 2-year warranty covers materials, design, and craftsmanship.\u003c\/li\u003e\n\u003c\/ol\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51279022063855,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/load-lock-equipped-coating-syste.webp?v=1792993585","url":"https:\/\/shop.torontech.com\/products\/load-lock-equipped-coating-system","provider":"Torontech","version":"1.0","type":"link"}