{"product_id":"bell-jar-thermal-evaporation-system","title":"Bell-Jar Thermal Evaporation System","description":"\u003ch2 dir=\"ltr\" aria-level=\"4\"\u003eBell-Jar Thermal Evaporation System | ToronEva™ Bell Jar\u003c\/h2\u003e\n\u003ch3 dir=\"ltr\" aria-level=\"4\"\u003eAutomated Thin Film Deposition for Research Laboratories\u003c\/h3\u003e\n\u003cp dir=\"ltr\"\u003eThe ToronEva™ Bell Jar is a fully automated thermal evaporation system designed for thin film deposition in research and development settings. Resistive heating inside a high-vacuum chamber allows it to produce metal, oxide, and organic films at base pressures as low as 10⁻⁷ Torr. Panel-based control, short cycle times, and an adjustable source-to-substrate distance make operation straightforward and help conserve evaporation material. The chamber accommodates 4-inch wafers, 1×3-inch lamellae, and a range of other substrate sizes, so it adjusts readily as deposition needs change.\u003c\/p\u003e\n\u003ch3 dir=\"ltr\" aria-level=\"4\"\u003eHigh-Vacuum Performance and Compact Design\u003c\/h3\u003e\n\u003cp dir=\"ltr\"\u003ePairing a turbomolecular pump with a mechanical pump, and equipped with an SS316 flex hose and a dust filter, the system reaches 10⁻⁶ Torr in less than 30 minutes. Its vacuum range extends from 1000 to 10⁻⁹ Torr, with automatic vent, back-fill, and chamber-hold functions. The bell jar comes in either Pyrex glass or SS304. At 75×120 cm, the footprint is compact enough to pass through a standard 85 cm doorway, and lockable wheels allow easy positioning. A closed-cycle water cooler with automatic on\/off control manages the heat load during long deposition runs.\u003c\/p\u003e\n\u003ch3 dir=\"ltr\" aria-level=\"4\"\u003eSequential and Co-Evaporation Capability\u003c\/h3\u003e\n\u003cp dir=\"ltr\"\u003eThe ToronEva™ Bell Jar supports both sequential and co-evaporation processes, with an optional four-source configuration for either 4×1 sequential or 2×2 co-evaporation. A servo-controlled shutter serves two thermal sources at the same time. A dual-channel thickness monitor with one QCM tracks deposition rate and cumulative film thickness in real time. The proprietary source-chamber geometry prevents cross-contamination between materials, keeping film purity intact across consecutive runs. Sample rotation from 2 to 30 rpm promotes uniform deposition across the substrate surface.\u003c\/p\u003e\n\u003ch2\u003eBell-Jar Thermal Evaporation System | ToronEva™ Bell Jar Applications\u003c\/h2\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/toronevatm-bell-jar-1385438475.webp?v=1792995191\" alt=\"Bell-Jar Thermal Evaporation System\"\u003e\u003c\/p\u003e\n\u003ch3\u003eWhere the ToronEva™ Bell Jar Is Used\u003c\/h3\u003e\n\u003cp\u003eThe ToronEva™ Bell Jar meets thin film deposition needs in research institutions, university laboratories, and specialized industrial facilities that require a laboratory vacuum coater for controlled thin-film processes. Its flexible chamber configuration and choice of sample holders make it a good match for many substrate types and deposition materials.\u003c\/p\u003e\n\u003ch3\u003eKey Application Areas\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eAcademic and University Research:\u003c\/strong\u003e Deposits metal, oxide, and organic films for fundamental materials science and device physics studies in campus laboratories.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSemiconductor Device Fabrication:\u003c\/strong\u003e Forms metal contacts, gate electrodes, and dielectric layers on silicon wafers for transistor and IC prototype development.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptical Thin Film Research:\u003c\/strong\u003e Applies reflective and anti-reflective coatings to glass and crystal substrates for photonics and optical component development.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOrganic Electronics and OLED Research:\u003c\/strong\u003e Provides controlled deposition of organic and metallic layers for organic photovoltaic cells, OLEDs, and thin-film transistor prototypes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMEMS and NEMS Fabrication:\u003c\/strong\u003e Supports metallization and functional film deposition during microelectromechanical and nanoelectromechanical device development.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSolar Cell Research:\u003c\/strong\u003e Deposits contact layers and absorber films for laboratory-scale photovoltaic cell prototyping and efficiency studies.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMaterials Science and Surface Engineering:\u003c\/strong\u003e Enables thin film characterization studies that demand precise control over film thickness, composition, and deposition rate.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eBell-Jar Thermal Evaporation System | ToronEva™ Bell Jar Key Features\u003c\/h2\u003e\n\u003ch3\u003eBuilt for Reproducible, Contamination-Free Deposition\u003c\/h3\u003e\n\u003cp\u003eThe ToronEva™ Bell Jar delivers high-vacuum performance together with features focused on repeatability, contamination control, and simple operation in research laboratory environments.\u003c\/p\u003e\n\u003ch3\u003eVacuum and Automation Features\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eFully Automated Vacuum Management:\u003c\/strong\u003e Panel control and quick cycle times cut down operator steps and preparation time between consecutive deposition runs.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e10⁻⁷ Torr Base Pressure with Fast Pump-Down:\u003c\/strong\u003e The system reaches a 10⁻⁶ Torr working pressure in less than 30 minutes, shortening cycle time during multi-run sessions.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eTurbomolecular and Mechanical Pump Stack:\u003c\/strong\u003e The paired pumps, together with an SS316 flex hose and dust filter, deliver clean, low-contamination vacuum across the full operating range.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWide-Range Vacuum Control (1000 to 10⁻⁹ Torr):\u003c\/strong\u003e An integrated control and measurement system with automatic vent and back-fill removes the need for manual valve operation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOne-Touch Vent Control:\u003c\/strong\u003e A single button starts the automatic vacuum management sequence, making chamber access simple without stepwise manual procedures.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePower-Failure Auto Shut-Off with Vacuum Hold:\u003c\/strong\u003e The system shuts down safely when power is lost and keeps the chamber under vacuum, protecting samples and preserving the deposition environment.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eIntegrated Closed-Cycle Water Cooler:\u003c\/strong\u003e Automatic thermal management switches cooling on and off as needed, protecting the system during continuous operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eChamber and Sample Handling\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003ePyrex Glass or SS304 Bell Jar:\u003c\/strong\u003e Operators can choose the chamber material that suits their process chemistry, and standard 1-inch ports allow flexible feedthrough integration.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVersatile Sample Holder Selection:\u003c\/strong\u003e Holders accommodate 4-inch wafers, 1×3-inch lamellae, and small to large samples, all with straightforward loading.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAdjustable Source-Substrate Distance:\u003c\/strong\u003e Repositioning the source relative to the substrate optimizes deposition angle and rate distribution without any chamber modification.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSS304 Internal Protection Jacket:\u003c\/strong\u003e This jacket shields the chamber interior from direct evaporant exposure, extending service intervals and simplifying cleanup after deposition.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e2 to 30 rpm Sample Rotation:\u003c\/strong\u003e Adjustable substrate rotation distributes vapor flux evenly, improving film thickness uniformity across the substrate area.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eEvaporation Sources and Process Control\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptional Four-Source Configuration:\u003c\/strong\u003e Supports 4×1 sequential or 2×2 co-evaporation to deposit alloy, compound, or multilayer films in a single pump-down cycle.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e2000 W Thermal Evaporation Power Supply:\u003c\/strong\u003e An output range of 10 V to 200 A handles both low-melting organics and high-temperature metals in one unit.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCross-Contamination Elimination Design:\u003c\/strong\u003e Proprietary source-chamber geometry prevents evaporant cross-contact between sources and chamber walls, preserving material purity.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eDual-Channel Thickness Monitor with QCM:\u003c\/strong\u003e Provides real-time monitoring of deposition rate and cumulative film thickness across two independent sources at once.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eServo-Controlled Dual-Source Shutter:\u003c\/strong\u003e One shared, servo-actuated shutter starts and stops deposition for both thermal sources simultaneously.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eUsability, Footprint, and Warranty\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eOperator-Friendly Interface:\u003c\/strong\u003e An intuitive control layout and clear display shorten the learning curve for new users and speed up daily laboratory operation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCompact Mobile Platform:\u003c\/strong\u003e The 75×120 cm footprint sits on lockable wheels, offering stable positioning while still allowing the system to be moved within the laboratory.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eStandard Doorway Clearance:\u003c\/strong\u003e The system fits through a standard 85 cm doorway, removing installation and relocation barriers in buildings with conventional corridor widths.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOne-Year Full Warranty:\u003c\/strong\u003e Coverage for design, materials, and workmanship gives laboratories confidence in long-term reliability and manufacturer accountability.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eBell-Jar Thermal Evaporation System | ToronEva™ Bell Jar Theory and Method\u003c\/h2\u003e\n\u003ch3\u003eHow Thermal Evaporation Works\u003c\/h3\u003e\n\u003cp\u003eThermal evaporation forms thin films by heating a source material to its vaporization point inside a high-vacuum chamber. A high-current, low-voltage power supply passes electrical current through a resistive source, such as a tungsten boat, coil, or basket. The vaporized atoms then move in straight lines through the vacuum and condense on substrate surfaces positioned above the source. Below 10⁻⁵ Torr, residual gas molecules are too sparse to scatter the vapor atoms, which results in high-purity films.\u003c\/p\u003e\n\u003ch3\u003eVacuum System and Power Supply\u003c\/h3\u003e\n\u003cp\u003eFilm quality depends on the vacuum system just as much as on the source material. A turbomolecular pump backed by a mechanical pump evacuates the chamber to base pressures below 10⁻⁷ Torr, bringing residual gas contamination down to negligible levels. Automatic vent and back-fill functions allow the operator to cycle the chamber without manual valve operation, while a hold-vacuum mode preserves the environment between depositions. The 2000 W (10 V to 200 A) power supply covers both low-melting organics and high-temperature refractory metals in a single unit.\u003c\/p\u003e\n\u003ch3\u003eThickness Monitoring and Uniformity\u003c\/h3\u003e\n\u003cp\u003eA dual-channel deposition controller and a quartz crystal microbalance (QCM) track film thickness in real time. As film mass builds up on the oscillating QCM crystal, its resonant frequency shifts in proportion to the deposited thickness, a relationship described by the Sauerbrey equation. The controller continuously converts this frequency shift into a thickness reading without interrupting deposition. Sample rotation at 2 to 30 rpm spreads the vapor flux evenly across the substrate, improving film uniformity.\u003c\/p\u003e\n\u003ch2\u003eBell-Jar Thermal Evaporation System - ToronEva™ Bell Jar Technical Specifications\u003c\/h2\u003e\n\u003ctable class=\"table\" border=\"1\" cellspacing=\"0\" cellpadding=\"0\" width=\"610\"\u003e\n\u003cthead\u003e\n\u003ctr\u003e\n\u003cth\u003eParameter\u003c\/th\u003e\n\u003cth\u003eSpecification\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003eThermal Evaporation Power Supply\u003c\/td\u003e\n\u003ctd\u003e2000 W (10 V – 200 A)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eBase Pressure\u003c\/td\u003e\n\u003ctd\u003e10⁻⁷ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWorking Vacuum Level (Pump-Down Time)\u003c\/td\u003e\n\u003ctd\u003e10⁻⁶ Torr in ≤30 minutes\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Control Range\u003c\/td\u003e\n\u003ctd\u003e1000 to 10⁻⁹ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePump Configuration\u003c\/td\u003e\n\u003ctd\u003eTurbomolecular + Mechanical\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePump Hose\u003c\/td\u003e\n\u003ctd\u003eSS316 flex hose with dust filter\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eBell-Jar Material\u003c\/td\u003e\n\u003ctd\u003ePyrex glass or SS304 cylinder\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eBell-Jar Ports\u003c\/td\u003e\n\u003ctd\u003eStandard 1-inch\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eInternal Protection Jacket\u003c\/td\u003e\n\u003ctd\u003eSS304 cylindrical\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSample Holder Options\u003c\/td\u003e\n\u003ctd\u003e4-inch wafer; 1×3-inch lamellae; small and large samples\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSource-to-Substrate Distance\u003c\/td\u003e\n\u003ctd\u003eAdjustable\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSample Rotation Speed\u003c\/td\u003e\n\u003ctd\u003e2 to 30 rpm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eThickness Monitoring\u003c\/td\u003e\n\u003ctd\u003eDual-channel thickness monitor + one QCM\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eStandard Number of Thermal Sources\u003c\/td\u003e\n\u003ctd\u003e2\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eOptional Source Configuration\u003c\/td\u003e\n\u003ctd\u003e4 sources (4×1 sequential or 2×2 co-evaporation)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eShutter\u003c\/td\u003e\n\u003ctd\u003eServo-controlled, common to two thermal sources\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eCooling System\u003c\/td\u003e\n\u003ctd\u003eClosed-cycle water cooler (automatic on\/off)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Management Functions\u003c\/td\u003e\n\u003ctd\u003eAutomatic vent, back-fill, and chamber-hold\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eFootprint\u003c\/td\u003e\n\u003ctd\u003e75 × 120 cm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eDoor Clearance\u003c\/td\u003e\n\u003ctd\u003ePasses through standard 85 cm doorway\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eMobility\u003c\/td\u003e\n\u003ctd\u003eLockable wheels\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWarranty\u003c\/td\u003e\n\u003ctd\u003e1 year (design, materials, and workmanship)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51279227027695,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/bell-jar-thermal-evaporation-sys.webp?v=1792995177","url":"https:\/\/shop.torontech.com\/products\/bell-jar-thermal-evaporation-system","provider":"Torontech","version":"1.0","type":"link"}