{"product_id":"thermal-evaporation-system","title":"Thermal Evaporation System","description":"\u003ch2 dir=\"ltr\"\u003eThermal Evaporation System – ToronTES™ 1000 | Automated Multilayer Thin Film Deposition\u003c\/h2\u003e\n\u003cp dir=\"ltr\"\u003eThe ToronTES™ 1000 is a fully automated thermal evaporation system built for sequential and simultaneous multilayer thin film deposition. Its 2×2 channel co-evaporation configuration supports four thermal evaporation sources, powered by a 12 V, 200 A supply with a voltage-current display for precise evaporation control. The SS304 prismatic or cylindrical chamber (30 to 60 cm box size) reaches a 10⁻⁷ Torr base pressure and a 10⁻⁶ Torr working vacuum in just 30 minutes. With a 1.5-hour cycle time and touch screen control, researchers can complete multiple deposition runs every day.\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003e\u003cstrong\u003eAccurate Rate and Thickness Control\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003eA dual-channel thickness controller supports 1 to 4 QCMs with 0.1 Å\/s resolution and averaged-value output, tracking deposition rate across all co-evaporation sources. Mass flow meter controlled gas inputs with isolation valves allow Ar and N₂ chamber backfill. An optional RF plasma cleaning unit provides in-situ substrate surface preparation. The isolation valve preserves chamber vacuum between experiments, while fully automated layer-by-layer deposition manages each coating sequence. Automatic closed-loop water cooling and 120 °C internal baking keep the system ready between runs.\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003e\u003cstrong\u003eHeated Deposition and Fast Pump-Down\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003eAn optional 50 to 600 °C PID substrate heater with 2 to 30 rpm rotation enables heated deposition on a wide range of substrate configurations. The turbomolecular and mechanical pump combination, with cryo and dry pump options, delivers the high pumping speed required for the 30-minute pump-down cycle.\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003e\u003cstrong\u003eCompact, Flexible Chamber Integration\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003eThe system’s 75×120 cm footprint sits on lockable wheels and passes through standard doors, making installation and relocation simple. Standard 1\", QF, CF, and ISO feedthrough ports, along with a front viewing window and rotatable shutter, support flexible chamber integration for varied lab setups.\u003c\/p\u003e\n\u003ch2 dir=\"ltr\"\u003eThermal Evaporation System – ToronTES™ 1000 Applications | Thin Film Deposition for Research and Production\u003c\/h2\u003e\n\u003cp dir=\"ltr\"\u003eThe ToronTES™ 1000 thermal evaporation system supports research and production thin film laboratories that need multilayer and co-evaporated metallic and inorganic film deposition with automated control and consistent deposition rates. Its 2×2 co-evaporation configuration and QCM-based thickness control suit research programs focused on heterogeneous multilayer stacks, alloy films, and compositionally graded layers.\u003c\/p\u003e\n\u003cul dir=\"ltr\"\u003e\n\u003cli\u003e\n\u003cstrong\u003eMetal Thin Film and Contact Deposition:\u003c\/strong\u003e Thermal evaporation of Au, Al, Cr, Ag, and other metallic films for semiconductor contacts, interconnects, and electrode metallization in device research.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMultilayer Thin Film Deposition:\u003c\/strong\u003e Sequential evaporation of different material layers in a single pump-down cycle for optical coatings, magnetic multilayers, and functional device stacks.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCo-Evaporation Alloy Film Research:\u003c\/strong\u003e Simultaneous dual-source co-evaporation of alloy and compound films, with composition tuned through the relative power settings of each source channel.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOLED and Organic Device Research:\u003c\/strong\u003e Thermal evaporation of metallic contact and charge-transport layers onto organic device structures that call for clean, high-vacuum metallic film deposition.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptical Mirror and Reflective Coating Deposition:\u003c\/strong\u003e High-rate evaporation of metallic reflectors for optical components, photonic devices, and telescope mirror fabrication.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSolar Cell and Energy Device Research:\u003c\/strong\u003e Thermal evaporation of metallic back contacts, absorber layers, and thin-film stack components for photovoltaic and energy device research.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAcademic and University Thin Film Research:\u003c\/strong\u003e An automated multilayer deposition platform for teaching and materials research across metallic and inorganic thin film systems.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2 dir=\"ltr\"\u003eThermal Evaporation System – ToronTES™ 1000 Key Features | Automated Co-Evaporation Platform\u003c\/h2\u003e\n\u003cp dir=\"ltr\"\u003eThe ToronTES™ 1000 thermal evaporation system combines a 2×2 co-evaporation source configuration, dual-channel QCM thickness monitoring, MFM gas control, and full LabVIEW-compatible automation in a compact, high-vacuum thin film deposition platform.\u003c\/p\u003e\n\u003cul dir=\"ltr\"\u003e\n\u003cli\u003e\n\u003cstrong\u003e2×2 Channel, 12 V to 200 A Co-Evaporation Sources with Power Display:\u003c\/strong\u003e Four thermal sources with a voltage-current display for controlled sequential and simultaneous two-material deposition in a single pump-down cycle.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e0.1 Å\/s Dual-Channel Thickness Monitoring with 1 to 4 QCMs:\u003c\/strong\u003e Multi-sensor thickness and rate monitoring with averaged-value output for improved measurement accuracy across co-deposition source channels.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eFully Automated Layer-by-Layer Deposition:\u003c\/strong\u003e Each coating layer runs under automatic control, with no operator intervention needed between deposition steps.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eTouch Screen and LCD Panel Control:\u003c\/strong\u003e A touch screen interface manages all system operations, with real-time status shown on the LCD display.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e10⁻⁷ Torr Base Pressure, 10⁻⁶ Torr in 30 Minutes:\u003c\/strong\u003e A turbomolecular and mechanical pump stack, with cryo and dry pump options, delivers fast pump-down for the 1.5-hour experiment cycle.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWide-Range Vacuum Control (1000 to 10⁻⁹ Torr):\u003c\/strong\u003e Integrated vacuum measurement and control from atmospheric pressure down to deep vacuum.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSS304 Chamber (30 to 60 cm, Prismatic or Cylindrical):\u003c\/strong\u003e Clean, electro-polished surfaces in multiple box sizes to match different substrate and source configurations.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eStandard 1-Inch, QF, CF, and ISO Feedthrough Ports:\u003c\/strong\u003e Configurable feedthrough selection for flexible gauge, source, and process gas integration.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMFM Controlled Gas Inputs with Ar or N₂ Chamber Backfill:\u003c\/strong\u003e Mass flow meter controlled gas delivery with isolation valves for selective chamber atmosphere management and post-deposition backfill.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum Hold with Isolation Valve:\u003c\/strong\u003e The chamber stays under vacuum between experiments, cutting pump-down time and shielding film surfaces from atmospheric exposure.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptional 50 to 600 °C PID Sample Heating:\u003c\/strong\u003e Substrate temperature management for film crystallinity and deposition onto heated substrates.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e2 to 30 rpm Adjustable Sample Rotation:\u003c\/strong\u003e Continuous speed adjustment for uniform film thickness across the substrate surface.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptional Sample Surface Cleaning by RF Plasma:\u003c\/strong\u003e In-situ RF plasma cleaning of substrate surfaces before deposition, without breaking vacuum.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAutomatic Closed-Loop Water Cooling:\u003c\/strong\u003e Thermal management of evaporation sources and chamber components during high-power co-evaporation runs.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eInternal Lighting and 120 °C Baking Capability:\u003c\/strong\u003e Chamber inspection lighting, plus baking for conditioning and residual moisture removal between runs.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eFront Viewing Window with Rotatable Shutter:\u003c\/strong\u003e Direct visual access for process monitoring, with a rotatable shutter for precise deposition timing and chamber protection.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e1.5-Hour Experiment Cycle Time:\u003c\/strong\u003e Rapid pump-down and process execution allow multiple deposition runs per day.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e75×120 cm Mobile Platform on Lockable Wheels:\u003c\/strong\u003e A compact footprint that passes through standard doors and allows flexible laboratory placement.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOne-Year Warranty for Design, Materials, and Workmanship:\u003c\/strong\u003e Annual coverage for system components and manufacturing quality.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2 dir=\"ltr\"\u003eThermal Evaporation System – ToronTES™ 1000 Theory and Method | How Resistive Thermal Evaporation Works\u003c\/h2\u003e\n\u003cp dir=\"ltr\"\u003eThermal evaporation deposits thin films by resistively heating a source material in high vacuum until it vaporizes. The released atoms travel upward and condense on the substrates above. A high-current supply drives current through a resistive boat, coil, or basket, rapidly heating the source to its vapor pressure threshold. Below 10⁻⁵ Torr, atoms travel without scattering and condense uniformly as a thin film. The ToronTES™ 1000’s 12 V to 200 A power supply with a voltage-current display gives the operator direct control over the evaporation rate throughout deposition.\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003e\u003cstrong\u003eCo-Evaporation and Sequential Deposition\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003eThe 2×2 co-evaporation configuration powers two channels simultaneously, each serving two sources, so two materials can be deposited in a single pump-down cycle. Co-evaporation produces alloy and compound films whose composition is set by the relative evaporation rates of each channel. A dual-channel QCM controller with 1 to 4 sensors and averaged-value output monitors each material’s rate in real time. Sequential operation of separate channels deposits distinct material layers without changing the substrate position or venting the chamber.\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003e\u003cstrong\u003eVacuum, Atmosphere, and Process Preparation\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\"\u003eThe turbomolecular and mechanical pump combination reaches a 10⁻⁷ Torr base pressure, monitored across a wide-range 1000 to 10⁻⁹ Torr measurement system. This supports both metallic evaporation and multilayer deposition. MFM-controlled Ar or N₂ gas inputs allow selective chamber backfill and controlled atmosphere conditions. An optional 50 to 600 °C PID substrate heater with 2 to 30 rpm rotation, together with optional RF plasma cleaning, extends the range of process preparation options. Automatic closed-loop water cooling and 120 °C internal baking keep the system in good condition between depositions.\u003c\/p\u003e\n\u003ch2\u003eThermal Evaporation System - ToronTES™ 1000 Technical Specifications\u003c\/h2\u003e\n\u003ctable class=\"table\" border=\"1\" cellspacing=\"0\" cellpadding=\"0\" width=\"610\"\u003e\n\u003cthead\u003e\n\u003ctr\u003e\n\u003cth\u003eParameter\u003c\/th\u003e\n\u003cth\u003eSpecification\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003eThermal Sources\u003c\/td\u003e\n\u003ctd\u003e2×2 channel co-evaporation configuration (4 sources)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSource Power Supply\u003c\/td\u003e\n\u003ctd\u003e12V to 200A per channel; voltage-current power display\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eBase Pressure\u003c\/td\u003e\n\u003ctd\u003e10⁻⁷ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWorking Vacuum (Pump-Down Time)\u003c\/td\u003e\n\u003ctd\u003e10⁻⁶ Torr in 30 minutes\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Control Range\u003c\/td\u003e\n\u003ctd\u003e1000 to 10⁻⁹ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePump Configuration\u003c\/td\u003e\n\u003ctd\u003eTurbomolecular + Mechanical (cryo and dry pump as options)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eChamber Material\u003c\/td\u003e\n\u003ctd\u003eSS304 (prismatic or cylindrical); electro-polished\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eChamber Sizes\u003c\/td\u003e\n\u003ctd\u003e30\/40\/50\/60 cm box size\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eFeedthrough Ports\u003c\/td\u003e\n\u003ctd\u003eStandard 1-inch, QF, CF, ISO\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSubstrate Heating (Optional)\u003c\/td\u003e\n\u003ctd\u003e50 to 600 °C (PID controlled)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSample Rotation Speed\u003c\/td\u003e\n\u003ctd\u003e2 to 30 rpm (adjustable)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePlasma Cleaning (Optional)\u003c\/td\u003e\n\u003ctd\u003eRF plasma (substrate surface)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eThickness Monitoring\u003c\/td\u003e\n\u003ctd\u003eDual-channel; 0.1 Å\/s; 1 to 4 QCMs; averaged value\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eGas Inputs\u003c\/td\u003e\n\u003ctd\u003eMFM controlled; Ar or N₂ backfill; isolation valves\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eCooling System\u003c\/td\u003e\n\u003ctd\u003eAutomatic closed-loop water cooling\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eInternal Baking\u003c\/td\u003e\n\u003ctd\u003eUp to 120 °C\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eObservation Window\u003c\/td\u003e\n\u003ctd\u003eFront viewing window; rotatable shutter\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eControl System\u003c\/td\u003e\n\u003ctd\u003eFully automatic computer control; touch screen; real-time LCD\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eExperiment Cycle Time\u003c\/td\u003e\n\u003ctd\u003e1.5 hours\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eFootprint\u003c\/td\u003e\n\u003ctd\u003e75 × 120 cm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eDoor Clearance\u003c\/td\u003e\n\u003ctd\u003ePasses through standard doors\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eMobility\u003c\/td\u003e\n\u003ctd\u003eLockable wheels\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWarranty\u003c\/td\u003e\n\u003ctd\u003e1 year (design, materials, and workmanship)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51260881273071,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/thermal-evaporation-system816718.webp?v=1792782938","url":"https:\/\/shop.torontech.com\/fr\/products\/thermal-evaporation-system","provider":"Torontech","version":"1.0","type":"link"}