{"product_id":"pecvd-tube-furnace","title":"PECVD Tube Furnace","description":"\u003ch2\u003ePECVD Tube Furnace - ToronTF™ PECVD\u003c\/h2\u003e\n\u003ch3\u003ePlasma-Enhanced Chemical Vapor Deposition (PECVD) Tube Furnace System\u003c\/h3\u003e\n\u003cp\u003eThe ToronTF™ PECVD integrates a 1100 °C quartz tube furnace with a 300 W, 13.56 MHz inductively coupled plasma (ICP) source in a single PECVD tube furnace system. Inside the quartz sample zone, the ICP plasma energizes the precursor gases, so deposition can take place at lower temperatures than conventional thermal CVD while also improving film quality. Quartz tubes are offered in 50, 80, and 100 mm diameters, each 1000 mm long, to suit a range of sample sizes. PID temperature control holds ±1 °C, keeping deposition conditions stable throughout the full 1100 °C operating range.\u003c\/p\u003e\n\u003ch3\u003eGas Delivery, Vacuum Control, and Thermal Programming\u003c\/h3\u003e\n\u003cp\u003eA three-channel mass flow controller (MFC) system regulates Ar, N₂, O₂, H₂, CH₄, and NH₃ gases, supplied either pure or as mixtures, and extra channels can be added as an option. Throttle, vent, and isolation valves work under automated PLC vacuum control to hold the working pressure between 1 and 100 mTorr. Programmable heating profiles with user-adjustable steps let operators define the thermal ramp and soak sequence for every run. Operation is flexible, with both a PC touch screen and panel controls available, while a closed-cycle water cooling loop protects system components during deposition.\u003c\/p\u003e\n\u003ch3\u003eSample Handling, Contamination Control, and Installation\u003c\/h3\u003e\n\u003cp\u003eA quartz sample holder keeps the plasma confined to the deposition zone, which prevents contact with the chamber walls and lowers the risk of contamination. An easy-access sample load door makes loading and unloading simple between deposition runs. The system's 75×120 cm footprint sits on lockable wheels and fits through standard doorways, and its 220V, 16A power requirement keeps facility installation straightforward. The 50, 80, and 100 mm quartz tube diameter options accommodate varying sample sizes and process gas volumes.\u003c\/p\u003e\n\u003ch2\u003ePECVD Tube Furnace - ToronTF™ PECVD Applications\u003c\/h2\u003e\n\u003ch3\u003eApplications of the ToronTF™ PECVD Tube Furnace\u003c\/h3\u003e\n\u003cp\u003eThe ToronTF™ PECVD supports research and academic laboratories that need plasma-enhanced chemical vapor deposition for a wide variety of film materials. By pairing plasma activation with tube furnace heating, it makes possible processes that thermal CVD or plasma alone cannot achieve. Its compact tube design and flexible gas configuration fit materials science, semiconductor, and energy research programs.\u003c\/p\u003e\n\u003ch3\u003eTypical Research Uses\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eDiamond and DLC Film Deposition:\u003c\/strong\u003e Plasma-activated decomposition of hydrocarbon gases for diamond-like carbon and nanocrystalline diamond film research, carried out at substrate temperatures lower than those thermal CVD requires.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSilicon Nitride Thin Film Research:\u003c\/strong\u003e Plasma decomposition of NH₃ and N₂ precursors to form Si₃N₄ passivation layers, gate dielectrics, and encapsulation films for semiconductor and photovoltaic device research.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSilicon Oxide Film Deposition:\u003c\/strong\u003e O₂ plasma-enhanced oxidation and co-deposition processes for SiO₂ gate dielectric, insulator, and passivation film research at controlled deposition temperatures.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCarbon Nanotube and Graphene Growth:\u003c\/strong\u003e Plasma-activated hydrocarbon decomposition on catalyst substrates for CNT growth and graphene synthesis within controlled temperature and gas environments.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAmorphous Silicon and Thin-Film Solar Cell Research:\u003c\/strong\u003e PECVD deposition of amorphous silicon and silicon nitride films for layer research and prototyping in thin-film photovoltaic devices.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSurface Nitridation and Plasma Treatment:\u003c\/strong\u003e Plasma nitridation of metal and semiconductor surfaces with N₂ or NH₃ plasma to modify surface properties without depositing a full film.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAcademic Materials Science Research:\u003c\/strong\u003e A flexible plasma CVD platform for exploratory thin film deposition across oxide, nitride, carbide, and carbon-based material systems.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003ePECVD Tube Furnace - ToronTF™ PECVD Key Features\u003c\/h2\u003e\n\u003ch3\u003eKey Features of the ToronTF™ PECVD Tube Furnace\u003c\/h3\u003e\n\u003cp\u003eThe ToronTF™ PECVD brings together a high-temperature tube furnace, an inductively coupled plasma source, a three-channel MFC gas system, and PLC vacuum automation. The result is a compact, mobile plasma CVD platform designed for research and academic laboratories.\u003c\/p\u003e\n\u003ch3\u003eFurnace and Temperature Performance\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003e1100 °C Maximum Furnace Temperature:\u003c\/strong\u003e Runs continuously up to 1100 °C, supporting high-temperature PECVD processes such as oxide, nitride, carbon, and refractory material deposition.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e±1 °C PID Furnace Temperature Control:\u003c\/strong\u003e Precise closed-loop regulation keeps deposition conditions stable and allows thermal recipes to be reproduced accurately.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eUser-Defined Programmable Heating Profiles:\u003c\/strong\u003e Multi-step heating sequences with adjustable ramp rates and soak times suit different film materials and post-deposition annealing treatments.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003ePlasma Source and Sample Zone\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003e300 W, 13.56 MHz Inductively Coupled Plasma Source:\u003c\/strong\u003e The external coil ICP design produces high-density plasma without introducing electrode materials into the deposition zone.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eQuartz Sample Holder with Plasma Confinement to Sample Zone:\u003c\/strong\u003e The plasma is geometrically confined to the sample region, concentrating reactive species at the substrate surface while shielding the rest of the chamber.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eQuartz Tube (1000 mm Length, 50\/80\/100 mm Diameter):\u003c\/strong\u003e Interchangeable quartz tube diameters fit different sample sizes and process gas volumes, and custom diameters are available on request.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eGas Control and Vacuum Management\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003e3-Channel MFC Gas Control (Ar, N₂, O₂, H₂, CH₄, NH₃):\u003c\/strong\u003e A mass flow controller system handles six precursor gas types and shows individual and mixed flows on a real-time digital display.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eExpandable Gas Line Configuration:\u003c\/strong\u003e Additional gas channels can be added beyond the standard three-channel setup, supporting a broader range of precursor chemistries.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eReal-Time Digital Gas Flow Display:\u003c\/strong\u003e Individual and mixed gas flow rates appear continuously on screen for process monitoring and documentation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAutomated PLC Vacuum Control Unit:\u003c\/strong\u003e One-button start, stop, and vent operation automates vacuum sequencing during experiment setup and shutdown.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eThrottle, Vent, and Isolation Valves with 1 to 100 mTorr Precision:\u003c\/strong\u003e Accurate working pressure control maintains stable plasma conditions throughout PECVD processes.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eOperation, Cooling, and Installation\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003ePC Touch Screen Control Option:\u003c\/strong\u003e A computer interface adds remote operation, recipe management, and real-time process monitoring alongside panel control.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eEasy-Access Sample Load Door:\u003c\/strong\u003e Samples can be loaded and unloaded without extensive chamber disassembly, making sample exchange between runs efficient.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eClosed-Cycle Water Cooling System:\u003c\/strong\u003e Active water cooling protects the plasma source and system components for the duration of deposition.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e220V, 16A Single-Phase Power Requirement:\u003c\/strong\u003e A standard single-phase electrical connection keeps laboratory installation simple.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e75×120 cm Mobile Platform on Lockable Wheels:\u003c\/strong\u003e The compact footprint passes through standard doorways, making installation and repositioning within the laboratory easy.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eWarranty\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eOne-Year Warranty for Design, Materials, and Workmanship:\u003c\/strong\u003e Annual coverage applies to system components, design quality, and manufacturing.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eTheory and Method\u003c\/h2\u003e\n\u003ch3\u003ePrinciples of Plasma-Enhanced CVD\u003c\/h3\u003e\n\u003cp\u003ePlasma-enhanced CVD uses a low-pressure plasma to activate precursor gases, so films can be deposited at lower substrate temperatures than thermal CVD allows. The plasma breaks reactive gases down into free radicals and ions, which build up a thin film when they reach the substrate surface. Because plasma energy takes the place of thermal activation, the usable deposition temperature range widens and a greater variety of film compositions becomes accessible. A quartz sample holder confines the plasma to the substrate region, concentrating reactive species where they are needed and limiting plasma exposure elsewhere in the system.\u003c\/p\u003e\n\u003ch3\u003eInductively Coupled Plasma and Thermal Activation\u003c\/h3\u003e\n\u003cp\u003eThe inductively coupled plasma (ICP) source delivers 300 W of RF power at 13.56 MHz through a coil mounted outside the quartz tube. This arrangement creates high-density plasma without allowing electrode materials into the deposition zone. The plasma is dense enough to dissociate O₂, N₂, H₂, CH₄, and NH₃, supporting oxide, nitride, and carbon-based film deposition. Furnace temperatures up to 1100 °C work together with plasma activation to reach film compositions that call for both thermal and plasma energy. User-defined heating profiles with adjustable steps set the thermal ramp and soak for each run.\u003c\/p\u003e\n\u003ch3\u003eGas Control, Vacuum, and Cooling\u003c\/h3\u003e\n\u003cp\u003eA three-channel MFC gas system regulates Ar, N₂, O₂, H₂, CH₄, and NH₃, supplied pure or mixed, with additional channels available as an option. Throttle, vent, and isolation valves hold process pressure between 1 and 100 mTorr under automated PLC vacuum control. PC touch screen operation gives remote oversight of the gas, vacuum, and heating sequence. Throughout deposition, a closed-cycle water cooling system protects both the plasma source and the chamber.\u003c\/p\u003e\n\u003ch2\u003ePECVD Tube Furnace - ToronTF™ PECVD Technical Specifications\u003c\/h2\u003e\n\u003ctable class=\"table\" border=\"1\" cellspacing=\"0\" cellpadding=\"0\" width=\"583\"\u003e\n\u003cthead\u003e\n\u003ctr\u003e\n\u003cth\u003eParameter\u003c\/th\u003e\n\u003cth\u003eSpecification\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003eFurnace Temperature\u003c\/td\u003e\n\u003ctd\u003eUp to 1100 °C (continuous)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eTemperature Control\u003c\/td\u003e\n\u003ctd\u003ePID, ±1 °C\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eQuartz Tube Length\u003c\/td\u003e\n\u003ctd\u003e1000 mm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eQuartz Tube Inner Diameter\u003c\/td\u003e\n\u003ctd\u003e50, 80, or 100 mm (custom diameters available)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePlasma Source Type\u003c\/td\u003e\n\u003ctd\u003eInductively coupled plasma (ICP)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePlasma Source Power\u003c\/td\u003e\n\u003ctd\u003e300 W\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePlasma Source Frequency\u003c\/td\u003e\n\u003ctd\u003e13.56 MHz\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eGas Control\u003c\/td\u003e\n\u003ctd\u003e3-channel MFC (Ar, N₂, O₂, H₂, CH₄, NH₃); expandable\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eGas Display\u003c\/td\u003e\n\u003ctd\u003eReal-time digital; individual and mixed flow rates\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWorking Pressure Range\u003c\/td\u003e\n\u003ctd\u003e1 to 100 mTorr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eValve Configuration\u003c\/td\u003e\n\u003ctd\u003eThrottle, vent, and isolation valves\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Control\u003c\/td\u003e\n\u003ctd\u003eAutomated PLC unit with start, stop, and vent functions\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eHeating Profile Control\u003c\/td\u003e\n\u003ctd\u003eUser-defined programmable profiles with adjustable steps\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eSample Holder\u003c\/td\u003e\n\u003ctd\u003eQuartz (plasma confined to sample zone)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eControl Interface\u003c\/td\u003e\n\u003ctd\u003ePC touch screen (optional) and panel control\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eCooling System\u003c\/td\u003e\n\u003ctd\u003eClosed-cycle water cooling\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePower Requirement\u003c\/td\u003e\n\u003ctd\u003e220V, 16A (110V is also available)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eFootprint\u003c\/td\u003e\n\u003ctd\u003e75 × 120 cm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eDoor Clearance\u003c\/td\u003e\n\u003ctd\u003ePasses through standard doorways\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eMobility\u003c\/td\u003e\n\u003ctd\u003eLockable wheels\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWarranty\u003c\/td\u003e\n\u003ctd\u003e1 year (design, materials, and workmanship)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51280328392943,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/pecvd-tube-furnace1050291131.webp?v=1793011486","url":"https:\/\/shop.torontech.com\/fr\/products\/pecvd-tube-furnace","provider":"Torontech","version":"1.0","type":"link"}