{"product_id":"high-vacuum-triple-magnetron-target-desk-sputter-coater-dst3-a-s","title":"High Vacuum, Triple Magnetron Target Desk Sputter Coater-DST3-A\/S","description":"\u003cdiv data-id=\"d090d42\" data-element_type=\"widget\" data-widget_type=\"elementskit-heading.default\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003ch2\u003eHigh Vacuum, Triple Magnetron Target Desk Sputter Coater – DST3-A\/S\u003c\/h2\u003e\n\u003cp\u003eThe DST3-A\/S is a versatile, multi-target high vacuum sputter coater with turbo molecular pumping, designed to deposit a broad range of materials. Its roomy 300 mm diameter chamber houses three 2\" water-cooled cathodes, which support long deposition runs.\u003c\/p\u003e\n\u003cp\u003eBoth RF and DC power supplies are available, so this triple magnetron target desk sputter coater can sputter semiconductors, dielectrics, and metal targets, including oxidizing and noble metals. An auto-adjustable matching box keeps reflected power to a minimum and helps refine the RF sputtering process.\u003c\/p\u003e\n\u003cp\u003eAn optional 300 V DC bias can be applied to the substrate to strengthen film adhesion and improve film structure.\u003c\/p\u003e\n\u003cp\u003eThe DST3 comes in two models, each defined by its cathode configuration.\u003c\/p\u003e\n\u003ch2\u003eApplications\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eMetal, semiconductor, and dielectric films\u003c\/li\u003e\n\u003cli\u003eNano and microelectronic applications\u003c\/li\u003e\n\u003cli\u003eSolar cell development\u003c\/li\u003e\n\u003cli\u003eCo-sputtering processes\u003c\/li\u003e\n\u003cli\u003eGLAD sputtering technique\u003c\/li\u003e\n\u003cli\u003eCoating of optical components\u003c\/li\u003e\n\u003cli\u003eThin film sensor fabrication\u003c\/li\u003e\n\u003cli\u003eProduction of magnetic thin film devices\u003c\/li\u003e\n\u003cli\u003eFine-grain structural deposition for SEM and FE-SEM sample preparation\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eFeatures and Advantages\u003c\/h2\u003e\n\u003ch3\u003eHardware\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eHigh vacuum performance from a built-in turbo pump\u003c\/li\u003e\n\u003cli\u003eDC power supply, with an optional RF power supply, for coating metals, semiconductors, and dielectrics\u003c\/li\u003e\n\u003cli\u003eThree 2-inch water-cooled, angled magnetron cathodes for alloy film production (DST3-A) and multilayer deposition\u003c\/li\u003e\n\u003cli\u003eLarge 8-inch sample holder stage on the DST3-S model\u003c\/li\u003e\n\u003cli\u003eCathode mask designed to deliver uniform deposition across large substrates (DST3-S)\u003c\/li\u003e\n\u003cli\u003eTwo quartz crystal monitoring systems, one fixed and one movable, for real-time thickness measurement with 1 nm precision\u003c\/li\u003e\n\u003cli\u003eGas injection managed by two Mass Flow Controllers (MFCs)\u003c\/li\u003e\n\u003cli\u003eElectronic gas valves\u003c\/li\u003e\n\u003cli\u003eTwo-stage rotary vane backing pump (diaphragm and scroll pump)\u003c\/li\u003e\n\u003cli\u003eFull range vacuum gauge\u003c\/li\u003e\n\u003cli\u003eCathode selection motor\u003c\/li\u003e\n\u003cli\u003eAdjustable sample rotation, height, and tilt (for 3-inch sample holders)\u003c\/li\u003e\n\u003cli\u003eThree manual shutters, with optional electronic shutters\u003c\/li\u003e\n\u003cli\u003eOptional programmable substrate heater\u003c\/li\u003e\n\u003cli\u003eUnlimited deposition time without breaking vacuum\u003c\/li\u003e\n\u003cli\u003eTwo-year warranty\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eAutomation\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eIntuitive touch screen for simple control of the coating process and fast data entry\u003c\/li\u003e\n\u003cli\u003eUser-friendly software that can be updated over a network connection\u003c\/li\u003e\n\u003cli\u003eOptional semi-fully automatic coating process\u003c\/li\u003e\n\u003cli\u003eRepeatable, programmable sputtering in automatic mode\u003c\/li\u003e\n\u003cli\u003eOptional adjustable DC, RF, and high current deposition parameters through the touch screen panel\u003c\/li\u003e\n\u003cli\u003eManual or automatic deposition by time or thickness\u003c\/li\u003e\n\u003cli\u003eStorage of coating recipes for repeatable depositions\u003c\/li\u003e\n\u003cli\u003eTarget selection for multilayer thin films\u003c\/li\u003e\n\u003cli\u003eElectronic shutters for precise control\u003c\/li\u003e\n\u003cli\u003eAutomated cathode selection\u003c\/li\u003e\n\u003cli\u003eSubstrate heater programming and control through the software\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eOptional Facilities\u003c\/h3\u003e\n\u003cp\u003eThe DST3 vacuum coater has a cylindrical Pyrex vacuum chamber measuring 300 mm in outer diameter and 200 mm in height. An internally mounted 90 L\/s turbo molecular pump, backed by a 6 m³\/h two-stage rotary vane pump, ensures efficient vacuum operation.\u003c\/p\u003e\n\u003ch3\u003eClean Vacuum\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eRF sputtering for depositing both conductive and non-conductive targets\u003c\/li\u003e\n\u003cli\u003ePlasma cleaner for enhanced cleaning capability\u003c\/li\u003e\n\u003cli\u003e300 V DC substrate bias voltage\u003c\/li\u003e\n\u003cli\u003e500 °C substrate heater for precise temperature control during coating\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eTouch Screen Control\u003c\/h3\u003e\n\u003cp\u003eThe DST3 includes a 7\" color touch-screen panel with user-friendly software for smooth control and adjustment of deposition process data. Vacuum and coating sequence information appears as digital readouts or curves on the screen, making monitoring straightforward. The system also keeps records of the last 300 coatings on a history page for easy reference.\u003c\/p\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/image-215.webp?v=1793008909\" alt=\"High Vacuum, Triple Magnetron Target Desk Sputter Coater-DST3-A\/S\"\u003e\u003c\/p\u003e\n\u003ch3\u003eSample Holder Stages\u003c\/h3\u003e\n\u003cp\u003eTwo standard sample holder sizes are available: 3 inches, offered on both the DST3-A and DST3-S models, and 8 inches, exclusive to the DST3-S. Custom sizes can also be requested to match specific requirements. The smaller sample holders include multiple clamps that secure small samples during rotation, providing a simple and effective solution.\u003c\/p\u003e\n\u003ch3\u003ePlasma Cleaner\u003c\/h3\u003e\n\u003cp\u003eThe DST3 can be fitted with an optional plasma cleaner. Plasma treatment, or cleaning, removes organic substances from a substrate's surface or modifies it using ionized gas, known as plasma. This process can change the surface properties of the substrate, increasing either its hydrophilicity or hydrophobicity so that later depositions go on effectively. Applying plasma before thin film deposition also clears surface contaminants, such as carbon-based residues and oxides, and improves adhesion between the substrate and the layers that follow.\u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 19.6px;\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/image-210_1.webp?v=1793009147\" alt=\"High Vacuum, Triple Magnetron Target Desk Sputter Coater-DST3-A\/S\"\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003ch3\u003eDST3-A (Angled Cathodes)\u003c\/h3\u003e\n\u003cp\u003eThe DST3-A has three angled cathodes that share a common focal point. This layout permits simultaneous sputtering from two or three (optional) targets, enabling alloy formation or multilayer deposition. The maximum substrate size for this model is 3 inches.\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003ctable width=\"100%\" style=\"height: 19.6px;\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/image-211_1.webp?v=1793009145\" alt=\"High Vacuum, Triple Magnetron Target Desk Sputter Coater-DST3-A\/S\"\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003ch3\u003eDST3-S (Straight Cathodes)\u003c\/h3\u003e\n\u003cp\u003eThe DST3-S is fitted with three straight 2-inch water-cooled cathodes. It is designed for sputtering a single large specimen up to 20 cm in diameter, or several smaller specimens.\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003ch2 class=\"accordion-button icon-link icon-link-hover\" id=\"accordion-field-technical-specifications\" data-group=\"group_specifications\" data-bs-toggle=\"collapse\" data-controls=\"field_technical_specifications\" aria-expanded=\"true\" role=\"button\" data-bs-target=\"#field-technical-specifications\" aria-controls=\"field-technical-specifications\"\u003eTechnical Specifications\u003c\/h2\u003e\n\u003ch2 class=\"accordion-header\" id=\"heading_field_technical_specifications\"\u003e\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eUltimate Vacuum: Less than 8x10-6 Torr\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003cdiv data-id=\"15bb855\" data-element_type=\"widget\" data-widget_type=\"eael-data-table.default\"\u003e\n\u003cdiv\u003e\n\u003cdiv data-table_id=\"15bb855\" id=\"eael-data-table-wrapper-15bb855\" data-custom_responsive=\"false\"\u003e\n\u003ctable class=\"table\" id=\"eael-data-table-15bb855\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003ePumping Speed (l\/s)\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e90\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e350\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003eUltimate Pressure (Torr)\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e8×10\u003csup\u003e-6\u003c\/sup\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003ctd colspan=\"\" rowspan=\"\" id=\"\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e3×10\u003csup\u003e-6\u003c\/sup\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003cdiv data-id=\"0d32230\" data-element_type=\"widget\" data-widget_type=\"elementskit-heading.default\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eEach cathode can independently control the sputtering rate to produce fine-grain structures.\u003c\/li\u003e\n\u003cli\u003eThe maximum thickness for each target, including the backing plate, is 6 mm.\u003c\/li\u003e\n\u003cli\u003eThe deposition power is automatically controlled regardless of the pressure.\u003c\/li\u003e\n\u003cli\u003eThe cathode temperatures are automatically regulated to prolong the life of the magnets.\u003c\/li\u003e\n\u003cli\u003eData is quickly recorded using fully automatic touch screen control.\u003c\/li\u003e\n\u003cli\u003eTwo precision Mass Flow meters (MFC) allow precise control of vacuum pressure and the flow of argon or other reactive sputtering gases.\u003c\/li\u003e\n\u003cli\u003eAn electronic throttle valve is included for the 350 l\/s turbo pump.\u003c\/li\u003e\n\u003cli\u003eCoating parameters are recorded and plotted.\u003c\/li\u003e\n\u003cli\u003eCurves and data from the deposition process can be transferred via a USB port to a PC.\u003c\/li\u003e\n\u003cli\u003eAn optional 300V DC bias voltage can be added.\u003c\/li\u003e\n\u003cli\u003eThere's an option for a plasma cleaner.\u003c\/li\u003e\n\u003cli\u003eThe system includes a 0-1200 V, 0-500 mA DC power supply.\u003c\/li\u003e\n\u003cli\u003eAn optional 300 W RF power supply with an automatic matching box is available.\u003c\/li\u003e\n\u003cli\u003eUtilities: 220\/110V, 50\/60HZ, with a current rating of 16\/25A.\u003c\/li\u003e\n\u003cli\u003eInstrument Dimensions: 600 Width × 800 Depth × 770 Height mm (excluding the rack).\u003c\/li\u003e\n\u003cli\u003eNet Weight: 160 kg, including the pump, rack, and instrument case.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003cdiv data-id=\"8229a92\" data-element_type=\"widget\" data-widget_type=\"elementskit-heading.default\"\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003cdiv\u003e\n\u003ch3\u003eOptions and Accessories\u003c\/h3\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eQuartz crystal sensor\u003c\/li\u003e\n\u003cli\u003eSpare glass chamber\u003c\/li\u003e\n\u003cli\u003eSputtering targets\u003c\/li\u003e\n\u003cli\u003eSealing gaskets\u003c\/li\u003e\n\u003cli\u003e300V DC bias voltage\u003c\/li\u003e\n\u003cli\u003ePlasma cleaner\u003c\/li\u003e\n\u003cli\u003e500°C substrate heater\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51280187457775,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/high-vacuum-triple-magnetron-tar.webp?v=1793009295","url":"https:\/\/shop.torontech.com\/fr\/products\/high-vacuum-triple-magnetron-target-desk-sputter-coater-dst3-a-s","provider":"Torontech","version":"1.0","type":"link"}