{"product_id":"vacuum-annealing-furnace","title":"Vacuum Annealing Furnace","description":"\u003ch2\u003eVacuum Annealing Furnace – ToronVF™ Anneal\u003c\/h2\u003e\n\u003ch3\u003eHigh-Vacuum Thermal Processing from 50 to 700 °C\u003c\/h3\u003e\n\u003cp\u003eToronVF™ Anneal is a high-vacuum annealing furnace built for thermal annealing, bake-out, quenching, and general heat treatment across a 50 to 700 °C range. A PID-controlled furnace sits inside an SS304 vacuum chamber and achieves a base pressure of 10⁻⁷ Torr, with heating rates adjustable from 1 to 20 °C\/minute. Quenching and cooling rates of up to ±50 °C\/minute make the system well suited to rapid thermal processing cycles and time-sensitive heat treatment programs. Each cycle is managed through a programmable 10-step PID profile, expandable to 40 steps, with independent setpoint, ramp, and soak parameters for every step.\u003c\/p\u003e\n\u003ch3\u003eClean Chamber and Wide-Range Vacuum System\u003c\/h3\u003e\n\u003cp\u003eThe electro-polished SS304 vacuum chamber delivers clean internal surfaces, making it a strong match for contamination-sensitive annealing work. The vacuum system covers a wide pressure range from 1000 to 10⁻⁹ Torr. A turbomolecular pump and a mechanical pump come standard and reach 10⁻⁶ Torr within 30 minutes, while a dry pump is available as an option. Isolation valves let operators backfill the chamber with Ar or N₂ as needed, and power failure protection holds the chamber under vacuum whenever the system is idle. Fast cycle times allow two to three experiments per day, depending on load volume.\u003c\/p\u003e\n\u003ch3\u003eFlexible Working Volume and Controlled Atmosphere Options\u003c\/h3\u003e\n\u003cp\u003eThe working volume is adjustable from 1 to 3 m³, accommodating a range of batch sizes and loading configurations. Optional mass flow meter gas inputs for Ar, N₂, O₂, He, and other gases support controlled-atmosphere processing alongside vacuum annealing and bake-out applications. An optional 100 amu residual gas analyzer identifies outgassing species and tracks chamber cleanliness before and during heat treatment.\u003c\/p\u003e\n\u003ch3\u003eCompact Footprint and Intuitive Controls\u003c\/h3\u003e\n\u003cp\u003eThe system occupies a 75×120 cm footprint and rolls on lockable wheels for easy positioning. A touch screen panel with real-time LCD control rounds out the package.\u003c\/p\u003e\n\u003ch3\u003eClean, Oxidation-Free Heat Treatment for Research and Production\u003c\/h3\u003e\n\u003cp\u003eThe ToronVF™ Anneal supports research and production facilities that need clean, oxidation-free heat treatment of metallic, ceramic, and semiconductor materials, where an atmospheric furnace would cause surface oxidation, scale, or unwanted phase reactions. Bake-out mode, quenching capability, an optional controlled atmosphere, and programmable multi-step profiles make it suitable for a wide range of thermal processing programs.\u003c\/p\u003e\n\u003ch2\u003eKey Applications\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum Annealing and Stress Relief:\u003c\/strong\u003e Heat treatment of metals, alloys, and semiconductors from 50 to 700 °C under high vacuum for stress relief, recrystallization, and grain growth, without surface oxidation or contamination.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eMagnetic Material Processing:\u003c\/strong\u003e Vacuum annealing of permanent magnets, soft magnetic alloys, and amorphous metals to develop magnetic properties, tune coercivity, and reduce hysteresis loss.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eVacuum Quenching and Rapid Thermal Processing:\u003c\/strong\u003e Rapid cooling at up to ±50 °C\/minute for martensite formation, retained austenite management, and metastable phase trapping in alloy systems.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eBake-Out and Degassing of Vacuum Components:\u003c\/strong\u003e High-temperature bake-out of vacuum chambers, electrodes, feedthroughs, and other components to desorb adsorbed water and hydrocarbons before assembly or use.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eHydrogen Removal and Dehydrogenation:\u003c\/strong\u003e Vacuum annealing to outgas hydrogen from titanium, zirconium, steel, and other hydrogen-susceptible materials following electroplating, forming, or joining processes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eThin Film and Semiconductor Post-Deposition Annealing:\u003c\/strong\u003e Vacuum annealing of thin film samples to activate dopants, improve crystallinity, and lower interface defect densities in semiconductor and photovoltaic device research.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePhase Transformation and Sintering Research:\u003c\/strong\u003e Programmable multi-step vacuum thermal cycles for phase diagram studies, solid-state reaction research, and ceramic or powder metallurgy sintering programs.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eA Scalable Vacuum Heat Treatment Platform\u003c\/h2\u003e\n\u003cp\u003eThe ToronVF™ Anneal brings together a PID-controlled high-vacuum furnace, multi-step programmable thermal profiles, rapid quenching, optional residual gas analysis, and fully automated computer control. All of this sits on a scalable vacuum heat treatment platform with an adjustable 1 to 3 m³ working volume.\u003c\/p\u003e\n\u003ch2\u003eFeature Overview\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003e50 to 700 °C PID-Controlled Vacuum Furnace:\u003c\/strong\u003e Precise temperature control inside an SS304 vacuum chamber delivers clean heat treatment free from atmospheric contamination.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eProgrammable PID Temperature Profile (10 to 40 Steps):\u003c\/strong\u003e Multi-step thermal cycle control with independent setpoint, ramp rate, and soak time for each step, supporting complex annealing and heat treatment schedules.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eAdjustable Heating Rate (1 to 20 °C\/Minute):\u003c\/strong\u003e An operator-selectable ramp rate adapts to material thermal mass, phase transformation requirements, and process sensitivity.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eQuenching and Rapid Cooling at ±50 °C\/Minute:\u003c\/strong\u003e High-rate thermal transitions for martensitic hardening, metastable phase formation, and transformation-sensitive heat treatment applications.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e1 to 3 m³ Adjustable Working Volume:\u003c\/strong\u003e A configurable chamber volume accommodates different batch sizes and loading configurations across research and production programs.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e10⁻⁷ Torr Base Pressure, 10⁻⁶ Torr in 30 Minutes:\u003c\/strong\u003e The turbomolecular and mechanical pump combination provides fast pump-down for efficient cycling.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eTurbomolecular and Mechanical Pump (Dry Pump Option):\u003c\/strong\u003e The standard pump configuration reaches the base vacuum needed for clean annealing, and a dry pump is available for oil-free system requirements.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWide-Range Vacuum Control (1000 to 10⁻⁹ Torr):\u003c\/strong\u003e Integrated vacuum measurement and control span atmospheric pressure to deep vacuum, covering every process mode.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptional 100 amu Residual Gas Analyzer:\u003c\/strong\u003e Compositional monitoring of outgassed species during bake-out and annealing supports contamination identification and process verification.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eOptional Mass Flow Meter Gas Inputs (Ar, N₂, O₂, He):\u003c\/strong\u003e Controlled-atmosphere capability for gas quench, inert backfill, and atmosphere-assisted processing alongside vacuum annealing modes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eIsolation Valves with Ar or N₂ Chamber Backfill:\u003c\/strong\u003e Provides a controlled atmosphere after annealing for inert cool-down, gas quench, or specific post-treatment requirements.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003ePower Failure Protection with Vacuum Hold:\u003c\/strong\u003e An isolation valve maintains chamber vacuum during a power loss, protecting sensitive samples and preserving the process environment.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eRapid Cycle Times (2 to 3 Experiments Per Day):\u003c\/strong\u003e Fast pump-down and efficient cycle design allow multiple heat treatment runs per day, depending on load volume.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eSS304 Electro-Polished Vacuum Chamber:\u003c\/strong\u003e Clean, low-outgassing chamber surfaces reduce contamination risk in high-purity annealing processes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eClosed-Loop Water Cooling (When Needed):\u003c\/strong\u003e Thermal management of furnace and chamber components during sustained high-temperature operation.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eFully Automatic Computer Control with Touch Screen and LCD Panel:\u003c\/strong\u003e Temperature, pressure, and process parameters are managed automatically, with real-time monitoring throughout each heat treatment cycle.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e75×120 cm Mobile Platform on Lockable Wheels:\u003c\/strong\u003e A compact footprint allows flexible placement on laboratory and production floors.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eTwo-Year Warranty for Design, Materials, and Workmanship:\u003c\/strong\u003e Extended coverage that reflects the system's role as a long-term research and production investment.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eVacuum Annealing Furnace – ToronVF™ Anneal Theory and Method\u003c\/h2\u003e\n\u003ch3\u003ePrinciples of Vacuum Annealing\u003c\/h3\u003e\n\u003cp\u003eVacuum annealing heats materials under low-pressure conditions. Removing oxygen and other reactive gases from the environment prevents surface oxidation and interstitial contamination during heat treatment. Below 10⁻⁵ Torr, residual gas concentrations are too low to contaminate the material surface, so surface chemistry stays intact while grain boundary diffusion drives microstructural development. Typical applications include stress relief, recrystallization, hydrogen outgassing, phase transformation, and magnetic property development. After annealing, a controlled Ar or N₂ backfill adjusts the cooling rate to support a controlled transformation or a quench.\u003c\/p\u003e\n\u003ch3\u003eProgrammable Thermal Cycles and Quenching\u003c\/h3\u003e\n\u003cp\u003eA programmable PID profile, expandable to 40 steps, governs every annealing cycle, with an independent setpoint, heating rate, and soak time for each step. This multi-step flexibility supports complex schedules, including multi-stage annealing with intermediate hold temperatures, stress-relief ramps, and controlled cooling sequences. Quenching at up to ±50 °C\/minute enables rapid thermal transitions for martensite formation, metastable phase trapping, and transformation-sensitive processes. Adjustable heating rates of 1 to 20 °C\/minute work alongside the quench capability to give precise control over the full thermal cycle.\u003c\/p\u003e\n\u003ch3\u003eBake-Out and Vacuum System Monitoring\u003c\/h3\u003e\n\u003cp\u003eBake-out at temperatures up to 700 °C desorbs water, solvents, and hydrocarbons from chamber surfaces and components, which lowers the effective base pressure. The turbomolecular pump continuously removes the desorbed species throughout the thermal cycle, so chamber cleanliness improves with each bake-out run. An optional 100 amu residual gas analyzer tracks outgassed species and verifies chamber cleanliness before sensitive downstream processes. Wide-range vacuum measurement from 1000 to 10⁻⁹ Torr and isolation valve protection round out the vacuum system.\u003c\/p\u003e\n\u003ch2\u003eVacuum Annealing Furnace - ToronVF™ Anneal Technical Specifications\u003c\/h2\u003e\n\u003ctable class=\"table\" border=\"1\" cellspacing=\"0\" cellpadding=\"0\" width=\"610\"\u003e\n\u003cthead\u003e\n\u003ctr\u003e\n\u003cth\u003eParameter\u003c\/th\u003e\n\u003cth\u003eSpecification\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003eFurnace Temperature Range\u003c\/td\u003e\n\u003ctd\u003e50 to 700 °C\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eTemperature Control\u003c\/td\u003e\n\u003ctd\u003ePID\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eHeating Rate\u003c\/td\u003e\n\u003ctd\u003e1 to 20 °C\/minute (adjustable)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eQuenching \/ Cooling Rate\u003c\/td\u003e\n\u003ctd\u003eUp to ±50 °C\/minute\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eTemperature Profile\u003c\/td\u003e\n\u003ctd\u003e10-step programmable PID (expandable to 40 steps)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eBase Pressure\u003c\/td\u003e\n\u003ctd\u003e10⁻⁷ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWorking Vacuum (Pump-Down Time)\u003c\/td\u003e\n\u003ctd\u003e10⁻⁶ Torr in 30 minutes\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Control Range\u003c\/td\u003e\n\u003ctd\u003e1000 to 10⁻⁹ Torr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eChamber Material\u003c\/td\u003e\n\u003ctd\u003eStainless Steel Type 304; electro-polished\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWorking Volume\u003c\/td\u003e\n\u003ctd\u003e1 to 3 m³ (adjustable)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePump Configuration\u003c\/td\u003e\n\u003ctd\u003eTurbomolecular + Mechanical (dry pump as option)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eGas Inputs (Optional)\u003c\/td\u003e\n\u003ctd\u003eMFM controlled; Ar, N₂, O₂, He, and others\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eChamber Backfill\u003c\/td\u003e\n\u003ctd\u003eAr or N₂ (via isolation valves)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eResidual Gas Analyzer (Optional)\u003c\/td\u003e\n\u003ctd\u003e100 amu\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eCooling System\u003c\/td\u003e\n\u003ctd\u003eClosed-loop water cooling (when needed)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePower Failure Protection\u003c\/td\u003e\n\u003ctd\u003eYes; isolation valve maintains vacuum\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eControl System\u003c\/td\u003e\n\u003ctd\u003eFully automatic computer control; touch screen; real-time LCD\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eExperiment Throughput\u003c\/td\u003e\n\u003ctd\u003e2 to 3 per day (depending on load volume)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eFootprint\u003c\/td\u003e\n\u003ctd\u003e75 × 120 cm\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eMobility\u003c\/td\u003e\n\u003ctd\u003eLockable wheels\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWarranty\u003c\/td\u003e\n\u003ctd\u003e2 years (design, materials, and workmanship)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e","brand":"Torontech","offers":[{"title":"Default Title","offer_id":51279055421679,"sku":null,"price":100.0,"currency_code":"CAD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0710\/5291\/9023\/files\/vacuum-annealing-furnace16558885.webp?v=1792993932","url":"https:\/\/shop.torontech.com\/es\/products\/vacuum-annealing-furnace","provider":"Torontech","version":"1.0","type":"link"}